Equipment customized production, with flexible configuration, can integrate a variety of deposition methods, ion Arc, sputtering, HiPIMS, RF, and etc., to meet the needs of special coatings and new industry applications, and provide more for the development of new coatings and new materials’ possibility. The equipment has the characteristics of fast deposition rate, good film consistency, and pollution-free production process, so as to meet customer requirements for products. We have rich industry experience and provide customers with turnkey services to solve customer concerns.
Advantages and benefits
The plasma density is very high; Strong coating adhesion; Under the microscope, the film layer is dense and free of pores; High wear resistance;
Technical indicators
Device Model | SP-0810ASI | SP-1112ASI | SP-1215ASI | SP-1512AI |
Vacuum Chamber Size (mm) | 800×1000 | 1100×1200 | 1200×1500 | 1500×1200 |
Maxium Vacuum | 6.0E-4Pa | |||
Air Extraction Time | Ambient Pressure to 5.0E-3Pa in less than 15 mins | |||
Pressure Rise Rate | 1h≤0.5Pa | |||
Vacuum Pump Set | Mechanical pump,Roots pump,Molecular pump,Maintenance pump | |||
Heating System | Room temperature to 500 ℃ (PID controlled) | |||
Air lnjection System | Mass flow controller (1-4 set) | |||
Targets | Cylindrical Target, Cloud Target, Sputtering Target,Gaseous lon Source, Evaporation Source | |||
Power Supply | HiPIMS Power Supply, Arc Power Supply, High Voltage Bombardment bias Power Supply,SPA Power Supply, Radio Frequency Power supply, etc. | |||
Workpiece Rotation Method | Public rotation+secondary rotation frequency conversion controllable and adjustable 1-5 revolutions per minute | |||
Operating Method | Manual+Semi-Automatic+Fully Automatic+PLC+IPC | |||
Note | Specifications can be fully customized according to customer's product and recipe requirements |
application area