Product Introduction

The equipment is equipped with multiple arc targets, sputtering targets, HiPIMS, etc. It can be coated separately with arc or magnetron sputtering, or it can take advantage of the advantages of both technologies to play a role in different stages of the coating process, such as using high-energy particles from the arc to bombard and clean the bottom layer at the initial stage of coating, in order to enhance the film/substrate bonding force; Subsequently, a medium frequency sputtering coating is used to obtain a delicate and smooth coating. This device can also be equipped with an ion source to meet the needs of multifunctional coating. It can complete single metal film and composite multi-layer film layers, suitable for the appearance needs of 3C digital products.