This equipment integrated a variety of patented technologies and deposition coating methods, the implanted software controls the cathode trajectory, and deposits imaging display coatings. Covers the entire process of substrate cleaning, film deposition (including ultra-thin film) and patterning and etching. Pilot and production lines can be provided. The equipment is equipped with MES system interfaces. The coating process data can be transmitted to the MES system and automatically recorded in real time, which can be connected to realize a smart factory.
Advantages and benefits
Multi-dimensional changes of the target source and ion source improve the uniformity and binding force of the polygonal film; seamless docking operation improves productivity; compatible with automatic loading and unloading industrial robots.
Technical indicators
Device Model | SP-0909AS | SP-1212ASI | SP-1520ASI | SP-2616ASI |
Vacuum Chamber Size (mm) | 900×900 | 1200×1200 | 1500×2000 | 2600×1600 |
Maxium vacuum | 6.0E-5Pa | |||
Air Extraction Time | Ambient Pressure to 5.0E10-3Pa in less than 10 mins | |||
Pressure Rise Rate | 1h≤0.5Pa | |||
Vacuum pump Set | Mechanical pump,Roots pump,Molecular pump,Maintaining Pump | |||
Heating System | Room temperature to 300 ℃ (PID controlled) | |||
Air lnjection System | Mass flow controller (1-8 set) | |||
Targets | Arc Target,Sputtering Target, Radio Frequency Target, lon Source | |||
Power Supply | HiPIMS Power Supply, MF Sputtering Power Supply, Arc Power Supply, DC Sputtering Power Supply, Radio Frequency Power Supply, lon sourco Power supply, etc. | |||
Workpiece Rotation Method | Revolution+rotation, linear variable frequency infinite speed regulation | |||
Operating Method | Manual+Semi-Automatic+Fully Automatic+PLC+IPC | |||
Note | Specifications can be fully customized according to customer's product and recipe requirements |
application area