Product Introduction
Glass substrate/display panel PVD coating production line. Through PVD coating technology, the glass substrate can be coated with copper on multiple sides.
Advantages and benefits
Flexible configuration to meet specific production needs; closed loop controlling logic for improved coating uniformity; seamless operation for increased productivity; optimized magnetic configuration for excellent uniformity and utilization;
Technical indicators
Device Model | SP-0606SI-LH | SP-1112S-LH |
Vacuum Chamber Size (mm) | 9000×700 | 15000×1100 |
Maximum Vacuum | 3.0E-4Pa | |
Pressure Rise Rate | 1h≤0.4Pa | |
Vacuum Pump Set | Mechanical pump,Roots pump,Molecular pump,Cryopump | |
Heating System | Room temperature to 300 ℃ | |
Air lnjection System | Mass flow controller | |
Sputtering Target | Rotating Cathode, Planar Sputtering Target,Polygonal Sputtering Target | |
Power Supply | DC Sputtering Power Supply, lon Power Supply | |
Workpiece Moving Method | Step(pass in one),Servo stepless speed regulation | |
control mode | Manual+semi-automatic+fully automatic integrated+PLC+IPC | |
Remote docking | MES | |
External Accesspries | Automatic loading and unloading device |
application area