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PRODUCT > Coating and film deposition equipment for structural components

Coating and film deposition equipment for structural components

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画板 1 拷贝 21.png Product Introduction

品牌(2).png The coating and film deposition equipment for structural components adopts the physical vapor deposition (PVD) technology. This technology vaporizes the surface of solid material sources into gaseous atoms, molecules or partially ionizes them into ions, and then deposits thin films with special functions on the surface of the substrate through low-pressure gas or plasma.

 

The PVD technology is widely used in fields such as aerospace, light industry and materials. It can be used to prepare film layers with characteristics like wear resistance, corrosion resistance, electrical conductivity, insulation and lubrication.


画板 1 拷贝 20.png Advantages and benefits

 1.png Coatings can be prepared by profile scanning according to the product structure；2.png The film layers are uniform and dense；3.png It has excellent adhesion.


画板 1 拷贝 22.png Technical indicators


Device ModelSP-2020ASISP-2030SISP-2540SISP-3050SI
Vacuum Chamber Size (mm)2000×2000
2000×30002500×40003000×5000
Maxium vacuum5.0E-4Pa
Air Extraction timeAmbient Pressure to 5.0E-3Pa in less than 30mins
Pressure Rise Rate1h≤0.5Pa
Vacuum Pump SetMechanical pump + Roots pump + Diffusion pump / Molecular pump
Heating SystemProfile-following heater,adjustable and controllable from room temperature to 300℃（PID temperature control）
Air lnjection SystemMass flow controller(1-8 set)
TargetPlanar target、Cylindrical rotating target 、arc target、ion source
Power SupplyMF Poert Supply、DC Power Supply、Arc Power Supply、Ion Power Supply
Workpiece Rotation MethodProfile-following motion / Rotational motion linked with the target.
Operating MethodManual+Semi-Automatic+Fully Automatic+PLC+IPC
NoteSpecifications can be fully customized according to customer's product and recipe requirements



画板 1 拷贝 23.png Application area

 







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